Sample	Time (hours)	Temperature (°C)	pH	Concentration (mM)
A	6	200	7	20
B	9	200	7	20
C	12	200	7	20
D	24	200	7	20
E	24	150	7	20
F	24	200	7	20
G	24	200	4	20
H	24	200	7	20
I	24	200	10	20
J	24	200	7	20
K	24	200	7	200

Table1 Reaction conditions for TiO2/LaAlO3 thin film deposition.

Figure 1 XRD patterns of TiO2 thin film on LAO substrate. (a) θ-2θ scan; (b) -scans of TiO2 (101) and LAO (101).

Figure 2 Cross-section TEM images of TiO2 thin film deposited on (001) LAO substrate.

Figure 3 SEM image of anatase TiO2 thin film on LAO substrate.

Figure 4 Ramus angle (angle between the FH plane and the ramus plane)

XRD patterns of TiO2/LAO in different reaction conditions shown in Table 1.

Figure 5 Gonial angle (angle between mandibular plane and ramus plane)

AFM images of TiO2 thin film on LAO substrate. (a) without SiO2 embedded; (b) with SiO2 embedded.

Figure 6 Cycle performance of pure and SiO2-embedded TiO2 at a current density of 100mA/g.