Sample

Time (hours)

Temperature (°C)

pH

Concentration (mM)

A

6

200

7

20

B

9

200

7

20

C

12

200

7

20

D

24

200

7

20

E

24

150

7

20

F

24

200

7

20

G

24

200

4

20

H

24

200

7

20

I

24

200

10

20

J

24

200

7

20

K

24

200

7

200

Table1 Reaction conditions for TiO2/LaAlO3 thin film deposition.

Figure 1 XRD patterns of TiO2 thin film on LAO substrate. (a) θ-2θ scan; (b) -scans of TiO2 (101) and LAO (101).

Figure 2 Cross-section TEM images of TiO2 thin film deposited on (001) LAO substrate.

Figure 3 SEM image of anatase TiO2 thin film on LAO substrate.

Figure 4 Ramus angle (angle between the FH plane and the ramus plane)

XRD patterns of TiO2/LAO in different reaction conditions shown in Table 1.

Figure 5 Gonial angle (angle between mandibular plane and ramus plane)

AFM images of TiO2 thin film on LAO substrate. (a) without SiO2 embedded; (b) with SiO2 embedded.

Figure 6 Cycle performance of pure and SiO2-embedded TiO2 at a current density of 100mA/g.