Figure 1 The setup of Reactive Spray Deposition Technology (RSDT)

Figure 2 Schematic of air quenching mechanism in RSDT

Figure 3X–ray diffraction of samples A, B, C, and D showing different crystallographic orientations and phase ratio.

Figure 4 Raman spectroscopy for samples A, B, C, and D showing mostly monoclinic structure.

Figure 5 Scanning Electron Microscopy micrographs of WO3 films deposited by RSDT under condition A, B, C and D. (Top: as deposited, Bottom: after annealing at 500 °C)

Figure 6 Transmission Electron Microscopy micrographs of WO3 films deposited by RSDT under conditions A, B, C, and D along with their selected area electron diffraction (SAED) patterns.

SampleSa
Sample

Substrate temperature
(0C)

Quench air flow               rate
(L/min)

Length of reaction zone(nozzle to substrate)
(cm)

Preferential
plane
orientation

Crystallite size
(nm)

A

350-400

0

17.1

002

33.1

B

200

0

13.3

None

61.6

C

100-130

28.3

20.6

200

29.0

D

80

56.6

12.6

020

42.3

Table 1. Synthesis conditions of WO3 in Reactive Spray Deposition Technology