Figure 1 The setup of Reactive Spray Deposition Technology (RSDT)
Figure 1 The setup of Reactive Spray Deposition Technology (RSDT)
Figure 2 Schematic of air quenching mechanism in RSDT
Figure 3X–ray diffraction of samples A, B, C, and D showing different crystallographic orientations and phase ratio.
Figure 4 Raman spectroscopy for samples A, B, C, and D showing mostly monoclinic structure.
Figure 5 Scanning Electron Microscopy micrographs of WO3 films deposited by RSDT under condition A, B, C and D. (Top: as deposited, Bottom: after annealing at 500 °C)
Figure 6 Transmission Electron Microscopy micrographs of WO3 films deposited by RSDT under conditions A, B, C, and D along with their selected area electron diffraction (SAED) patterns.
SampleSa |
Substrate temperature |
Quench air flow rate |
Length of reaction zone(nozzle to substrate) |
Preferential |
Crystallite size |
A |
350-400 |
0 |
17.1 |
002 |
33.1 |
B |
200 |
0 |
13.3 |
None |
61.6 |
C |
100-130 |
28.3 |
20.6 |
200 |
29.0 |
D |
80 |
56.6 |
12.6 |
020 |
42.3 |
Table 1. Synthesis conditions of WO3 in Reactive Spray Deposition Technology